This report presents the findings from investigating the use of novel multifunctional dielectric layers to simplify processing of high-efficiency silicon solar cells.
This Project aims to investigate the application of novel multifunctional dielectric layers based on phosphorus oxide (POx) to reduce surface recombination and simplify processing of high-efficiency silicon solar cells.
Key findings of the project so far include:
- Excellent performance of POx-based dielectric stacks on textured and n+ diffused silicon surfaces has been shown, as well as compatibility with standard SiNx capping and high-temperature firing processes
- Investigations of the chemical structure and composition of POx-based stacks have revealed substantial structural changes occurring at elevated temperatures, which help to explain the origins of their unique electrical properties
- The ability to form local electrical contacts via laser processing of silicon surfaces coated with POx-based dielectric stacks has been experimentally demonstrated, opening the way for applications in devices