This report discusses the project results and lessons learnt to date for the UNSW Project, Advanced High Efficiency Silicon Solar Cells Employing Innovative Atomic Scale Engineered Surface and Contact Passivation Layers.
The objective of this project is to develop ultra-thin films which can be used to improve the performance of current or next-generation solar cells in a cost-effective way. Just before the halfway point of the project, we are very excited that we have already been successful in the development and subsequent transfer of a new application of an ultra-thin film to the photovoltaic industry. We have also been able to upgrade a pilot-scale atomic layer deposition (ALD) reactor to a versatile R&D enabled reactor which will be housed in Sydney and be used to accelerate our future R&D and commercialisation efforts. We have identified a wide range of promising materials at the laboratory scale, which will be further investigated in the remaining two years of this project in close collaboration with our academic and industry partners.